Formation and growth of the intermediate phases in the Ni-Al diffusion couples prepared by pouring technique were invest......

Interfacial modification is crucial to fully develop the potential of semiconductor devices,including the revolutionary ......

在pH值0.5～2.5、温度25℃和时间12 h的条件下,研究碳酸盐岩型黄铜矿在H2SO4-Fe2(SO4)3-FeSO4-H2O体系中的溶解行为.实验所用的颗粒......